This course aims to enable students to delve into advanced processes for creating intricate nanoscale devices, covering silicon-based microfabrication fundamentals and advanced techniques such as doping, lithography, and etching. The course also allows students grasp the intricate steps in nanoelectronic production and explore emerging electronics and optoelectronics designs shaping future technology.
Upon successful completion of this course, students will be able to:
(1) Describe the intricacies of nanoelectronic manufacturing processes,
(2) Explain silicon-based microfabrication technologies,
(3) Analyze doping techniques and their implications for device performance,
(4) Apply lithography and etching processes to create precise nanoscale patterns,
(5) Evaluate the challenges and potential solutions in nanoscale device integration and packaging,
(6) Design layouts and fabrication strategies for novel electronics/optoelectronics devices.
Madou, M. J. (2011). Manufacturing Techniques for Microfabrication and Nanotechnology. CRC Press.
Test/Exam (60%), Performance Project (Written, Oral) (40%)
| Workload | Hrs |
|---|---|
| Lectures | 42 |
| Course Readings | 70 |
| Field Trips/Visits | 2 |
| Exams/Quizzes | 65 |
| Resource Review | 43 |
| Oral Presentation | 3 |